Nikon is attempting a turnaround by targeting ASML’s legacy ArF lithography market with aggressive pricing advantages. Read ...

If EUV is out of reach and access to DUV is tightening, there is a limit to how far chipmakers can go with older gear and new ...

China's latest domestically produced DUV exposure machine cannot perform the critical multiple exposures needed for advanced chip production, making it incapable of achieving finer process nodes like ...

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What just happened? China has long sought to lessen its reliance on foreign chipmakers and focus on its home-grown options, part of the Made in China 2025 plan to update its domestic manufacturing ...

In a development that could reshape the global semiconductor race, Huawei filed a patent outlining a path to 2 nm-class chip production using only deep-ultraviolet (DUV) lithography tools – the very ...

China's Nanta Opto-electronic Material has successfully developed DUV ArF photoresists that can support production of 90-28nm chips, aiming to serve import-substitution demand for photoresists used in ...